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Dimitrios Mataras

Materials Science and Technology
+30 2610 969525
+30 2610 993361
Google Scholar Citations Profile:
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Curriculum Details

  • Diploma, Chemical Engineering, Polytechnic University of Timisoara, 1982
  • Ph.D.,Chemical Engineering, University of Patras, 1990

Plasma Processing - Thin Films

Physics and Chemistry of low pressure gas discharges. Plasma-surface interaction. Optical and electrical plasma diagnostics. Plasma modelling. Optimal PECVD equipment design for deposition of thin films and/or surface treatment.
  • Materials:
    • Amorphous, nan0- and micro- Crystalline Hydrogenated Silicon
    • Diamond-Like Carbon
    • SiOx, TiOx, YSZ
    • Polymer-Like Coatings
  • Techniques:
    • RF Power and Impedance control
    • Laser Induced Fluorescence
    • Spatially Resolved Optical Emission
    • Laser Interferometry
    • Mass Spectrometry
    • CFD Modelling
  • Applications:
    • Large Area Thin-Film Photovoltaics
    • Materials for Microelectronics
    • Hard Coatings
    • Barrier Coatings
    • Modification of surface properties (wetability, adhesion)
    • Microfluidics
    • Biocompatible materials and surfaces

Exploration of the deposition limits of microcrystalline silicon
D Mataras
Pure and applied chemistry 77 (2), 379-389 (2005)

High pressure regime of plasma enhanced deposition of microcrystalline silicon
E Amanatides, A Hammad, E Katsia, D Mataras
Journal of Applied Physics 97 (7), 073303-073303-10 (2005)

Power dissipation and impedance measurements in radio‐frequency discharges
N Spiliopoulos, D Mataras, DE Rapakoulias
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 14 (5) 2757-2765 (1996)

Covalent immobilization of liposomes on plasma functionalized metallic surfaces
S Mourtas, M Kastellorizios, P Klepetsanis, E Farsari, E Amanatides, D Mataras, BR Pistillo, P Favia, E Sardella, R d’Agostino, SG Antimisiaris
Colloids and Surfaces B: Biointerfaces 84 (1), 214-220 (2011)

Staphylococcus epidermidis adhesion to He, He/O2 plasma treated PET films and aged materials: Contributions of surface free energy and shear rate
M Katsikogianni, E Amanatides, D Mataras, YF Missirlis
Colloids and Surfaces B: Biointerfaces 65 (2), 257-268 (2008)

Comparative study of plasma-deposited fluorocarbon coatings on different substrates
E Farsari, M Kostopoulou, E Amanatides, D Mataras, DE Rapakoulias
Journal of Physics D: Applied Physics 44 (19), 194007 (2011)

RF power effect on TEOS/O2 PECVD of silicon oxide thin films
C Voulgaris, A Panou, E Amanatides, D Mataras
Surface and Coatings Technology 200 (1), 351-354 (2005)