Department Department Department Department Department Department Department

Eleftherios Amanatides

Associate Professor
Materials Science and Technology
+30 2610 969523
+30 2610 993361
Google Scholar Citations Profile:
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Curriculum Details

  • B.S (diploma), Chemistry, University of Ioannina, 1995
  • Ph.D. , Chemical Engineering, University of Patras, 2001

Plasma Processing of materials:

Preparation methods of nanostructured materials. Deposition and treatment process optimization through the application of plasma diagnostics and modeling. Thin film characterization. Correlation of process parameters to the materials properties.
A. Plasma Enhanced Chemical Vapor Deposition (PECVD) of semiconductive amorphous and microcrystalline silicon for thin film photovoltaics,
B. Plasma etching and functionalization of polymeric and metallic substrates for biomedical applications. Plasma treatment of living tissues,
C. Protective coatings (a-C:H και SiOx), hydrophobic teflon-like thin films (CFx) and nano-structured ceramic materials (YSZ) for fuel cells.

Diagnostics and reactors design

Physical and chemical processes of low temperature plasmas for deposition and surface treatment of nanostructured materials (inorganic oxides, polymers). In – situ plasma electrical & spectroscopic (Laser Induce Fluorescence, Optical Emission Spectroscopy) measurements. Development of ultra fast in situ diagnostics for deposition process analysis and materials characterization. Design and installation of low and high density plasma reactors.

Plasma modelling

Computational Fluid Dynamics (CFD) modeling of plasma deposition and surface treatment processes. Cost effective optimization and design of medium and large area reactors for industrial applications

"On the high pressure regime of plasma enhanced deposition of microcrystalline silicon"
E. Amanatides, A. Hammad, E. Katsia, D. Mataras, J. Appl. Phys. 97, 073303 (2005)

"Frequency variation under constant power conditions in hydrogen radio frequency discharges"
E. Amanatides and D. Mataras , J. Appl. Phys. 89, 1556 (2001)

"Gas-phase and surface kinetics in Plasma Enhanced Chemical Vapor Deposition of microcrystalline silicon", E. Amanatides, S. Stamou, D. Mataras, J. Appl. Phys. 90, 5786 (2001)

"Plasma surface treatment of polyethylene terephthalate films for bacterial repellence"
E. Amanatides, D. Mataras, M. Katsikogianni and Y.F. Missirlis, Surf. Coat. Technol. 200, 6331 (2006)

"Staphylococcus epidermidis Adhesion to He, He/O2 Plasma Treated PET Films and Aged Materials: Contributions of Surface Free Energy and Shear Rate"
Maria G. Katsikogianni, Christos S. Syndrevelis, Eleftherios K. Amanatides, Dimitrios S. Mataras, Yannis F. Missirlis, Colloids and Surfaces B: Biointerfaces, 65 (2008) 257-268

"On the effect of frequency in the deposition of microcrystalline silicon from silane discharges"
E. Amanatides, D. Mataras, D. E. Rapakoulias, J. Appl. Phys. 90, 5799 (2001)

"Plasma emission diagnostics for the transition from microcrystalline to amorphous silicon solar cells"
E. Amanatides, D. Mataras, D. E. Rapakoulias, M. N. van den Donker, B. Rech, Sol. Energy Mater. Sol. Cells. 87, 795 (2005)

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