- B.S (diploma), Chemistry, University of Ioannina, 1995
- Ph.D. , Chemical Engineering, University of Patras, 2001
Plasma Processing of materials:
Preparation methods of nanostructured materials. Deposition and treatment process optimization through the application of plasma diagnostics and modeling. Thin film characterization. Correlation of process parameters to the materials properties.
A. Plasma Enhanced Chemical Vapor Deposition (PECVD) of semiconductive amorphous and microcrystalline silicon for thin film photovoltaics,
B. Plasma etching and functionalization of polymeric and metallic substrates for biomedical applications. Plasma treatment of living tissues,
C. Protective coatings (a-C:H και SiOx), hydrophobic teflon-like thin films (CFx) and nano-structured ceramic materials (YSZ) for fuel cells.
Diagnostics and reactors design
Physical and chemical processes of low temperature plasmas for deposition and surface treatment of nanostructured materials (inorganic oxides, polymers). In – situ plasma electrical & spectroscopic (Laser Induce Fluorescence, Optical Emission Spectroscopy) measurements. Development of ultra fast in situ diagnostics for deposition process analysis and materials characterization. Design and installation of low and high density plasma reactors.
Plasma modelling
Computational Fluid Dynamics (CFD) modeling of plasma deposition and surface treatment processes. Cost effective optimization and design of medium and large area reactors for industrial applications
“A Novel Plasma-Enhanced Solvolysis as Alternative for Recycling Composites”, Marinis D., Markatos D., Farsari E., Amanatides E., Mataras D., Pantelakis S., Polymers, 16 (19), art. no. 2836 2024
“Chemical recovery of carbon fibers from composites via plasma assisted solvolysis”, Marinis D., Farsari E., Alexandridou C., Amanatides E., Mataras D., Journal of Physics: Conference Series, 2692 (1), art. no. 012017 2024
“A hybrid computational framework for the simulation of atmospheric pressure plasma jets: The importance of the gas flow model”, Passaras D., Amanatides E., Kokkoris G., Plasma Sources Science and Technology, 30 (12), art. no. 125018 2021
“Predicting the flow of cold plasma jets in kINPen: A critical evaluation of turbulent models”, Passaras D., Amanatides E., Kokkoris G., Journal of Physics D: Applied Physics, 53 (26), art. no. 265202 2020
“Glancing angle deposition effect on structure and light-induced wettability of RF-sputtered TiO2 thin films”, Vrakatseli V.E., Kalarakis A.N., Kalampounias A.G., Amanatides E.K., Mataras D.S., Micromachines, 9 (8), art. no. 389 2018
“On the reliable probing of discrete 'plasma bullet' propagation”, Svarnas P., Gazeli K., Gkelios A., Amanatides E., Mataras D., Measurement Science and Technology, 29 (4), art. no. 045016 2018
SiH4 enhanced dissociation via argon plasma assistance for hydrogenated microcrystalline silicon thin-film deposition and application in tandem solar cells”, Li T., Xu S., Huang Q., Ren H., Ni J., Li B., Zhang D., Wei C., Amanatides E., Mataras D., Zhao Y., Zhang X., Solar Energy Materials and Solar Cells, 180, pp. 110 – 117 2018
